Taiwan University has successfully developed a touch sensor using CMOS technology
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In order to achieve development under the CMOS process, the sacrificial layer uses metal. In this way, the metal film is etched together in the sacrificial layer etching stage, so the final desired metal film is passivated in advance to ensure that it is not etched. The prototype was subjected to a 0.35 μm process of a 2-layer polymer 4-layer metal of TSMC.